Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent
Propriétés de base
Lieu d'origine:
Chine
Nom de marque:
Senzhuo
Attestation:
ISO9001
Numéro de modèle:
SZ-HF-03
Propriétés commerciales
Quantité minimum de commande:
1KG
Prix:
US $45 - 60/ kg
Conditions de paiement:
T/T, Western Union, LC
Capacité à fournir:
40 tonnes par mois
Résumé du produit
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...
Détails du produit
Mettre en évidence:
electronic grade HFIP
,wafer cleaning solvent
,low metal 920-66-1
Product Name:
Le HFIP
CAS:
920-66-1
MF:
C3H2F6O
MW:
168.04
Grade:
Plaquette électronique
Metals:
10 ppb chacun
Filtration:
0.2 microns
Description du produit
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,
Ms. Rossi
Export Manager
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