Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent
Proprietà di base
Luogo di origine:
Cina
Marchio:
Senzhuo
Certificazione:
ISO9001
Numero di modello:
SZ-HF-03
Proprietà Commerciali
Quantità minima di ordine:
1KG
Prezzo:
US $45 - 60/ kg
Condizioni di pagamento:
T/T, Western Union, L/C
Capacità di approvvigionamento:
40 tonnellate al mese
Riepilogo Prodotto
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...
Dettagli del prodotto
Evidenziare:
electronic grade HFIP
,wafer cleaning solvent
,low metal 920-66-1
Product Name:
HFIP
CAS:
920-66-1
MF:
C3H2F6O
MW:
168.04
Grade:
Wafer elettronico
Metals:
10 ppb ciascuno
Filtration:
0.2 micron
Descrizione del prodotto
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,
Ms. Rossi
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