Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent
Βασικές ιδιότητες
Χώρος καταγωγής:
Κίνα
Ονομασία μάρκας:
Senzhuo
Πιστοποίηση:
ISO9001
Αριθμός μοντέλου:
SZ-HF-03
Εμπορικά Ακίνητα
Ελάχιστη ποσότητα παραγγελίας:
1KG
Τιμή:
US $45 - 60/ kg
Όροι πληρωμής:
T/T, Western Union, L/C
Ικανότητα εφοδιασμού:
40 τόνοι το μήνα
Σύνοψη του προϊόντος
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...
Λεπτομέρειες για το προϊόν
Επισημαίνω:
electronic grade HFIP
,wafer cleaning solvent
,low metal 920-66-1
Product Name:
Επενδύσεις
CAS:
920-66-1
MF:
C3H2F6O
MW:
168.04
Grade:
Electronic wafer
Metals:
10 ppb each
Filtration:
0.2 μικρών
Περιγραφή του προϊόντος
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,
Ms. Rossi
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