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Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent

Basic Properties
Place of Origin: China
Brand Name: Senzhuo
Certification: ISO9001
Model Number: SZ-HF-03
Trading Properties
Minimum Order Quantity: 1kg
Price: US $45 - 60/ kg
Payment Terms: T/T, Western Union, L/C
Supply Ability: 40 tons per month
Product Summary
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...

Product Details

Highlight:

electronic grade HFIP

,

wafer cleaning solvent

,

low metal 920-66-1

Product Name: HFIP
CAS: 920-66-1
MF: C3H2F6O
MW: 168.04
Grade: Electronic Wafer
Metals: 10 Ppb Each
Filtration: 0.2 Micron
Product Description

On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay.

Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium, iron, aluminium, calcium and copper individually, which is what a fab questionnaire actually asks for.

Key Features
  • Metals under 10 ppb each: no ionic contamination to shift threshold voltage or leave a stain
  • 0.2 micron filtered into PFA: particle counts that suit a cleanroom dispensing point
  • Low surface tension drying: high aspect ratio features dry without collapse
  • Water 100 ppm maximum: no acid formation on aluminium or copper features
  • PFA packaging only: no leaching from glass or HDPE over the storage period
  • Per lot ICP-MS report: individual metal figures, not a single total
Technical Specifications
ParameterSpecification
Product Name1,1,1,3,3,3-Hexafluoro-2-propanol (HFIP)
CAS Number920-66-1
Molecular FormulaC3H2F6O
Molecular Weight168.04 g/mol
EINECS213-059-4
HS Code29055900
GradeElectronic, wafer grade
Assay (GC)99.9% minimum
Water Content (Karl Fischer)100 ppm maximum
Metals (ICP-MS, each)10 ppb maximum
Particles above 0.2 micron100 per mL maximum
Non Volatile Residue10 ppm maximum
AppearanceColourless clear liquid
Filtration0.2 micron at filling
Boiling Point59 degrees C
Density (25 degrees C)1.59 to 1.60 g/mL
Storage15-25 degrees C, sealed under nitrogen, clean area
Shelf Life18 months in unopened packaging
Where It Is Used

Post etch and post ash residue removal, drying of high aspect ratio MEMS and via structures, cleaning of photomask and optical surfaces, and as a carrier for specialty formulations in wafer level packaging.

Dispense from the PFA bottle directly into the tool, avoid transfer through stainless steel fittings for long contact times, and keep the bottle closed when not in use. If the process runs at elevated temperature, check the seal material against an HFIP compatibility table first.

Packing, Storage and Transport

1 kg PFA bottle and 4 L fluorinated can, both filtered at filling and nitrogen blanketed. Packaging is specified to keep particles and metals at the level the certificate states through the shelf life.

Store between 15 and 25 degrees C in a clean, ventilated area, sealed and under nitrogen. Air freight with the standard documentation; drums only on request.

Analysis and Paperwork

COA with assay, water, individual metals by ICP-MS, particle count, non volatile residue and colour, plus the GC trace. A retention sample is kept for 18 months in PFA.

Fab style documentation available on request: SDS, metals report, particle report and a packing list noting the filtration step. We can also quote a custom metal limit for a specific tool.

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