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Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent

Properti Dasar
Tempat Asal: Tiongkok
Nama merek: Senzhuo
Sertifikasi: ISO9001
Nomor Model: SZ-HF-03
Properti Perdagangan
Jumlah Pesanan Minimum: 1KG
Harga: US $45 - 60/ kg
Ketentuan Pembayaran: T/T, Western Union, L/C
Kemampuan Pasokan: 40 ton per bulan
Ringkasan Produk
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...

Rincian produk

Menyoroti:

electronic grade HFIP

,

wafer cleaning solvent

,

low metal 920-66-1

Product Name: HFIP
CAS: 920-66-1
MF: C3H2F6O
MW: 168.04
Grade: Wafer elektronik
Metals: masing-masing 10 ppb
Filtration: 0,2 mikron
Deskripsi Produk
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,
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