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خونه / محصولات / حلال HFIP / Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent
کیفیت Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent کارخانه
کیفیت Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent کارخانه
کیفیت Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent کارخانه

Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent

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محل تولید: چین
نام تجاری: Senzhuo
گواهینامه: ISO9001
شماره مدل: SZ-HF-03
املاک تجاری
حداقل مقدار سفارش: 1 کیلوگرم
قیمت: US $45 - 60/ kg
شرایط پرداخت: T/T، Western Union، L/C
توانایی عرضه: 40 تن در ماه
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99.50% خلوص هگزافلوئوروایزوپروپانول,HFIP CAS 920-66-1,مایع بی‌رنگ هگزافلوئوروایزوپروپانول

HFIP CAS 920-66-1

Colorless Liquid Hexafluoroisopropanol
خلاصه محصول
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...

جزئیات محصول

برجسته کردن:

electronic grade HFIP

,

wafer cleaning solvent

,

low metal 920-66-1
Product Name: HFIP
CAS: 920-66-1
MF: c3h2f6o
MW: 168.04
Grade: ویفر الکترونیکی
Metals: هر کدام 10ppb
Filtration: 0.2 میکرون
توضیحات محصول
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,

Ms. Rossi

Export Manager

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