Electronic Grade HFIP CAS 920-66-1 Ultra Low Metal Wafer Cleaning Solvent
Podstawowe właściwości
Miejsce pochodzenia:
Chiny
Nazwa marki:
Senzhuo
Certyfikacja:
ISO9001
Numer modelu:
SZ-HF-03
Nieruchomości handlowe
Minimalna ilość zamówienia:
1 KG
Ceny:
US $45 - 60/ kg
Warunki płatności:
T/T, Western Union, akredytywa
Możliwość dostaw:
40 ton miesięcznie
Podsumowanie produktu
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a ...
Szczegóły produktu
Podkreślić:
electronic grade HFIP
,wafer cleaning solvent
,low metal 920-66-1
Product Name:
HFIP
CAS:
920-66-1
MF:
C3H2F6O
MW:
168.04
Grade:
Elektroniczny opłatek
Metals:
10 ppb każdy
Filtration:
0,2 mikrona
Opis produktu
On a wafer, HFIP is used for two jobs: removing residues that water and alcohol leave behind, and drying high aspect ratio structures without collapse, because the low surface tension lets it leave a gap cleanly. Both jobs fail if the solvent carries particles or metals, and neither shows up on a standard assay. Our electronic grade is distilled and then filtered to 0.2 micron into PFA, with metals measured by ICP-MS rather than estimated. Each lot reports sodium, potassium,
Ms. Rossi
Export Manager
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